EMI Magnetic Control Sputtering Coating Machine
|Payment Terms:||L/C, T/T|
Feature and essential parameter:
1. There are vertical and horizongtal structures, which can achieve pedion coating or double face coating meanwhile.
2. High manufacturing efficiency, the fastest speed can meet 1 minute/time.
3. Pattern assembly design, it is convenient to maintain.
4. The coating technical maturity, the rate of finished product is high.
5. The direct current magnetic sputtering cathode can be elected according to the customer's requirement.
6. Vacuum system: Machanical pump, diffusion pump, roots pump
7. Max size: 2200mm× 1200mm(length× Width)
8. Min size: 500mm× 400mm(length× Width)